25th European Mask and Lithography Conference (12-15 January 2009, Dresden, Germany)Behringer, Uwe F. W.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, various pagings, isbn 978-0-8194-7770-5 0-8194-7770-2Conference Proceedings

High Resolution Cell ProjectionWEIDENMUELLER, U; HAHMANN, P; LEMKE, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700P.1-74700P.9Conference Paper

CDP: Application of focus drillingGEISLER, S; BAUER, J; HAAK, U et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747015.1-747015.6Conference Paper

SEMATECH Mask ProgramYUN, Henry; RASTEGAR, Abbas; KEARNEY, Patrick et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747005.1-747005.4Conference Paper

Contamination control for ArF photo masksGORDON, Joseph S; SILOVA, Marianna; CONNOLLY, Brid et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700C.1-74700C.13Conference Paper

Decomposition Algorithm for Double Patterning of Contacts and Via LayersEL-GAMAL, A; AL-IMAM, M.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747008.1-747008.8Conference Paper

Residual-free imprint for sensor definitionMAYER, A; BOGDANSKI, N; MÖLLENBECK, S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700K.1-74700K.9Conference Paper

SEM image contrast modeling for mask and wafer metrologyFRASE, C. G; GNIESER, D; JOHNSEN, K.-P et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700M.1-74700M.11Conference Paper

A Solution to Meet New Challenges on EBDW Data PrepGALLER, R; MELZER, D; GRAMSS, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700S.1-74700S.13Conference Paper

Increasing inspection equipment productivity by utilizing Factory Automation SW on TeraScan 5XX systemsJAKUBSKI, Thomas; PIECHOCINSKI, Michal; MOSES, Raphael et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700V.1-74700V.10Conference Paper

Ion Beam Deposition for Defect-Free EUVL Mask BlanksKEARNEY, Patrick; LIN, C. C; SUGIYAMA, Takashi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700X.1-74700X.7Conference Paper

Sub-30 nm defect removal on EUV substratesRASTEGAR, Abbas; EICHENLAUB, Sean; KADAKSHAM, Arun John et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700Z.1-74700Z.6Conference Paper

EUV and DUV scatterometry for CD and edge profile metrology on EUV masksBODERMANN, Bernd; WURM, Matthias; DIENER, Alexander et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700F.1-74700F.12Conference Paper

EUV imaging performance: moving towards productionVAN SETTEN, Eelco; LOK, Sjoerd; VAN DIJK, Joep et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700G.1-74700G.12Conference Paper

High speed (>100 Gbps) key components for a scalable optical data link, to be implemented in future maskless lithography applicationsPARASKEVOPOULOS, A; VOSS, S.-H; TALMI, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747011.1-747011.8Conference Paper

MAPPER: HIGH THROUGHPUT MASKLESS LITHOGRAPHYKUIPER, V; KAMPHERBEEK, B. J; STEENBRINK, S. W. H. K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700Q.1-74700Q.5Conference Paper

Mask Industry Assessment Trend AnalysisHUGHES, Greg; YUN, Henry.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747003.1-747003.11Conference Paper

Mask contribution on CD & OVL errors budgets for Double Patterning LithographySERVIN, I; LAPEYRE, C; BARNOLA, S et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747009.1-747009.13Conference Paper

Mask salvage in the age of capital contractionKIMMEL, Kurt R.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747004.1-747004.6Conference Paper

Mounting Methodologies to Measure EUV Reticle NonflatnessSIVA BATTULA, Venkata; ZEUSKE, Jacob R; ENGELSTAD, Roxann L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747014.1-747014.14Conference Paper

New writing strategy in electron beam direct write lithography to improve critical dense lines patterning for sub-45nm nodesMARTIN, L; MANAKLI, S; ICARD, B et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700R.1-74700R.12Conference Paper

Reduced Pellicle Impact on Overlay using High Order Intrafield Grid CorrectionsDE KRUIF, Robert; VAN RHEE, Tasja; VAN DER HEIJDEN, Eddy et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700O.1-74700O.11Conference Paper

The task of EUV-reflectometry for HVM of EUV-masks: first stepsFARAHZADI, Azadeh; WIES, Christian; LEBERT, Rainer et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700E.1-74700E.7Conference Paper

UV NIL template making and imprint evaluationSASAKI, Shiho; HIRAKA, Takaaki; MIZUOCHI, Jun et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 74700J.1-74700J.7Conference Paper

Extended Abbe approach for fast and accurate lithography imaging simulationsEVANSCHITZKY, P; ERDMANN, A; FÜHNER, T et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7470, issn 0277-786X, isbn 978-0-8194-7770-5 0-8194-7770-2, 1Vol, 747007.1-747007.11Conference Paper